Reasearch areas of IMiO divisions

Article index

  1. Microelectronics and Nanoelectronics Devices Division
  2. VLSI Engineering and Design Automation Division
  3. Image and Microwave Photonics Division
  4. Microsystem and Electronic Material Technology Division
  5. Optoelectronics Division

Microsystem and Electronic Material Technology Division

The research activity of the Division concentrates on optoelectronic and hybrid devices. Fundamental and applied research are carried out. Research groups are organised for defined tasks.

 

The main research areas are as follows:

  • fabrication and investigation of the following optoelectronic devices: integrated passive and active light wave guiding structures (modulators, bistable switches etc.) and fibre optic sensors;
  • computer engineering for fibre optics;
  • new techniques of surface mounted devices on PCB (printed circuit boards);
  • application of thin and thick film technology in hybrid devices and thick film sensors fabrication;
  • investigation of the electronic structure, stability and optical properties of amorphous silicon and its devices (thin film transistors, solar cells, etc.);
  • research, design and monitoring of photovoltaic systems, strategy for development of photovoltaic solar energy;
  • electronic packaging technology;
  • plasma deposition of nanocrystalline diamond (NCD), diamond-like carbon (DLC) thin films and their application in fibre optic and waveguide sensing structures.